Nirasaki, Japan

Satoshi Onodera

This inventor holds 3 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2016-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Satoshi Onodera. Retrieved from https://idiyas.com/inventor/satoshi-onodera-genfaxry

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.5

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Yamanashi, JP (2016)
  • Nirasaki, JP (2016 - 2017)

Company Filing History:


Years Active: 2016-2017

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3 patents (USPTO):Explore Patents

Title: Innovations by Satoshi Onodera: Advancements in Epitaxial Growth Methods

Introduction: Satoshi Onodera, an innovative inventor based in Nirasaki, Japan, has made significant contributions to the field of semiconductor technology. With a total of three patents to his name, Onodera has demonstrated expertise in methods that enhance the efficiency and precision of epitaxial growth processes.

Latest Patents: Among his latest patents, the "Selective Epitaxial Growth Method and Film Forming Apparatus" stands out. This method includes preparing a target object with a single crystal substrate where an epitaxial growth region is separated by a suppression film. The process involves growing an epitaxial layer through a series of source gas supply and removal steps, ensuring that the desired film thickness is achieved. Another notable patent is the "Depression Filling Method and Processing Apparatus," which focuses on filling depressions in a workpiece comprising a semiconductor substrate. This method involves forming a thin film of semiconductor material, followed by annealing and etching processes to create an epitaxial region that aligns with the substrate's crystals.

Career Highlights: Satoshi Onodera is associated with Tokyo Electron Limited, a prominent player in the semiconductor manufacturing equipment industry. His career reflects a commitment to advancing semiconductor technology through innovative solutions that address critical challenges in film formation and growth processes.

Collaborations: Throughout his career, Onodera has collaborated with notable colleagues, including Daisuke Suzuki and Akinobu Kakimoto. These partnerships have likely played a pivotal role in the development and refinement of his patented technologies.

Conclusion: Satoshi Onodera's contributions to semiconductor technology, particularly through his innovative patents, illustrate his dedication to enhancing manufacturing processes in the industry. His work not only reflects his expertise but also emphasizes the continuous evolution of technologies that support the growing demands of the semiconductor market.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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