Satoshi Mizunaga

Title: Satoshi Mizunaga: Innovator in Substrate Processing Technology

Introduction

Satoshi Mizunaga is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 7 patents. His work focuses on innovative methods and systems that enhance the efficiency and effectiveness of substrate processing.

Latest Patents

Mizunaga's latest patents include a substrate processing system and a substrate processing method. The substrate processing system features an etching apparatus designed to supply a gas containing fluorocarbon to generate plasma for etching a silicon film on a substrate. This process is executed through a mask formed on the silicon film. Additionally, a film forming apparatus is included, which supplies a gas containing carbon to create a carbon film on the etched silicon film. The etching process consists of two steps: a first etching step that partially etches the silicon film using plasma, followed by a second etching step that further etches the silicon film, which has a carbon film formed on it. The film forming apparatus operates without generating plasma during the film forming step.

Another notable patent is the method and apparatus for forming a carbon film. This method involves loading a substrate with a pre-formed carbon film into a processing chamber. The hydrocarbon-based carbon source gas is thermally decomposed in the chamber to create a carbon film on the substrate. The film forming temperature is set below the thermal decomposition temperature of the hydrocarbon gas, and a non-plasma thermal CVD method is employed.

Career Highlights

Satoshi Mizunaga is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has allowed him to develop and refine his innovative substrate processing technologies.

Collaborations

Mizunaga has collaborated with notable colleagues, including Takehiro Otsuka and Mitsuhiro Okada. These collaborations have contributed to the advancement of substrate processing technologies and have fostered a productive research environment.

Conclusion

Satoshi Mizunaga's contributions to substrate processing technology through his innovative patents and collaborations highlight his role as a key inventor in this field. His work continues to influence advancements in semiconductor manufacturing processes.