This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Tokyo Electron Limited. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Satoru Nakamura - Innovator in Plasma Processing Technology
Introduction
Satoru Nakamura is a notable inventor based in Kurokawa, Japan. He has made significant contributions to the field of plasma processing technology. His innovative approach has led to the development of a unique detection method that enhances the efficiency of plasma processing apparatuses.
Latest Patents
Nakamura holds a patent for a "Detection method and plasma processing apparatus." This patent outlines a method implemented in a plasma processing apparatus that includes a plasma processing chamber and a substrate support. The detection method involves disposing a substrate on the substrate support, performing plasma processing by generating plasma, measuring temperatures of heaters, and detecting significant points in the substrate support based on the measured temperatures. He has 1 patent to his name.
Career Highlights
Satoru Nakamura is associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work focuses on improving plasma processing techniques, which are crucial for the production of semiconductor devices.
Collaborations
Nakamura collaborates with Toshihisa Ozu, contributing to advancements in their field through shared expertise and innovative ideas.
Conclusion
Satoru Nakamura's contributions to plasma processing technology exemplify the impact of innovative thinking in the semiconductor industry. His patent and ongoing work continue to influence advancements in this critical area of technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile