Satoru Kawazu

Title: Satoru Kawazu: Innovator in Fine Pattern Formation

Introduction

Satoru Kawazu is a prominent inventor based in Hyogo, Japan. He has made significant contributions to the field of fine pattern formation, holding a total of five patents. His innovative methods have advanced the technology used in various applications.

Latest Patents

One of Satoru Kawazu's latest patents involves a method of forming fine patterns. This method includes the reforming of sidewalls of patterned resist using a reforming agent selected from a specific group. The agents include a carbon trichloride radical, a mixture of silicon ion and oxygen ion, a mixture of carbon ion and carbon monoxide ion, a chlorine radical, aluminum trichloride liquid, and dibutyl magnesium liquid. The process results in sidewall reformed portions being formed on the sidewalls of the pattern resist. The unrefined portions of the patterned resist are then removed, leaving the sidewall reformed portions on the object layer. Subsequently, the portion of the object layer, excluding the area immediately below the sidewall reformed portions, is etched away, resulting in the formation of fine patterns on the object layer.

Career Highlights

Throughout his career, Satoru Kawazu has worked with notable companies, including Mitsubishi Electric Corporation and Ryoden Semiconductor System Engineering Corporation. His experience in these organizations has contributed to his expertise in the field of semiconductor technology and pattern formation.

Collaborations

Satoru Kawazu has collaborated with several professionals in his field, including Chikayuki Okamoto and Tadashi Nishioka. These collaborations have likely enhanced his innovative capabilities and contributed to his successful patent applications.

Conclusion

Satoru Kawazu is a distinguished inventor whose work in fine pattern formation has led to significant advancements in technology. His patents and collaborations reflect his commitment to innovation and excellence in the field.