Satoru Funato

Title: Satoru Funato: Innovator in Photoresist Technology

Introduction

Satoru Funato is a notable inventor based in Shizuoka, Japan. He has made significant contributions to the field of photoresist technology, holding a total of 6 patents. His work focuses on improving the quality and efficiency of photoresist materials used in various applications.

Latest Patents

One of his latest patents is a development defect preventing process and material. This invention involves a composition for reducing development defects, which includes an acidic composition containing a surfactant applied onto a chemically amplified photoresist coating formed on a substrate with a diameter of 8 inches or more. This process enhances the hydrophilicity of the resist surface and prevents the formation of a slightly soluble layer in the developer, leading to improved pattern profiles. Another significant patent is a method for forming patterns and a treating agent for use therein. This method includes several steps, such as applying a chemically amplified photoresist film, applying a treating agent with a pH value of 1.3 to 4.5, and developing the film. The method improves the wetting properties of the developing solution, resulting in resist patterns with better shapes.

Career Highlights

Throughout his career, Satoru Funato has worked with various companies, including Clariant Finance (BVI) Limited and Az Electronic Materials USA Corp. His experience in these organizations has contributed to his expertise in the field of photoresist technology.

Collaborations

Satoru has collaborated with notable coworkers such as Yoshiaki Kinoshita and Yuko Yamaguchi. Their combined efforts have further advanced the innovations in photoresist materials and processes.

Conclusion

Satoru Funato's contributions to photoresist technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to impact the industry positively.