Company Filing History:
Years Active: 2009-2017
Title: Innovations by Santhana Raghavan Parthasarathy
Introduction
Santhana Raghavan Parthasarathy is an accomplished inventor based in Nashua, NH (US). He holds a total of 4 patents that showcase his expertise in the field of chemical vapor deposition (CVD) and polysilicon production. His innovative approaches have contributed significantly to advancements in silicon filament technology.
Latest Patents
One of his latest patents is titled "Increased polysilicon deposition in a CVD reactor." This invention presents a method for producing bulk polysilicon by replacing conventional silicon 'slim rods' with shaped silicon filaments that have larger surface areas. These filaments, which can take the form of tubes or ribbons, allow for a higher production rate without altering the reactor size. The process involves the decomposition of silicon-containing gases, such as chlorosilane or silane, to form silicon deposits on the filaments' hot surfaces.
Another notable patent is the "Method of making large surface area filaments for the production of polysilicon in a CVD reactor." This method involves melting silicon and growing filaments using the Edge-defined, Film-fed Growth (EFG) technique. The filaments maintain a constant cross-sectional shape and can be doped with elements from groups 3 and 5 of the Periodic Table. This innovation simplifies the production process and enhances the efficiency of polysilicon manufacturing.
Career Highlights
Santhana Raghavan Parthasarathy has worked with notable companies such as GTAT Corporation and GT Solar Incorporated. His experience in these organizations has allowed him to refine his skills and contribute to significant advancements in the field of silicon technology.
Collaborations
Throughout his career, he has collaborated with talented individuals, including Yuepeng Wan and Carl Chartier. These partnerships have fostered a creative environment that has led to groundbreaking innovations in the industry.
Conclusion
Santhana Raghavan Parthasarathy's contributions to the field of polysilicon production and CVD technology are noteworthy. His innovative patents and collaborative efforts have positioned him as a significant figure in the realm of silicon filament advancements.