Hwaseong-si, South Korea

Sangoh Park

USPTO Granted Patents = 6 

Average Co-Inventor Count = 3.3

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2022-2025

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6 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Sangoh Park

Introduction

Sangoh Park is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work focuses on advanced methods for designing pattern layouts and manufacturing semiconductor devices.

Latest Patents

Among his latest patents, Sangoh Park has developed a method for designing pattern layouts that include oblique edges. This innovative approach involves performing optical proximity correction (OPC) for a mask layout, resulting in a corrected layout. The process includes creating a first corrected layout through grid snapping for an oblique edge and subsequently performing OPC for this layout to produce a second corrected layout. Additionally, he has patented methods for manufacturing semiconductor devices, which detail the structure and arrangement of various components within a substrate, including bit line structures and contact plugs.

Career Highlights

Sangoh Park is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of semiconductor technology. His expertise in optical proximity correction and semiconductor device manufacturing has positioned him as a key player in the industry.

Collaborations

Sangoh Park has collaborated with talented coworkers, including Hungbae Ahn and Seunghune Yang, contributing to the advancement of their projects and innovations.

Conclusion

Sangoh Park's contributions to semiconductor technology through his patents and work at Samsung Electronics Co., Ltd. highlight his role as an influential inventor in the field. His innovative methods are paving the way for future advancements in semiconductor manufacturing.

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