This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignees: Samsung Electronics Co., Ltd., Samyoung Pure Chemicals Co., Ltd.. Active years: 2022.
Company Filing History:
1 out of 132,107 
1 out of 6 Years Active: 2022
Title: The Innovative Contributions of Sangmoon Yun
Introduction
Sangmoon Yun is a notable inventor based in Cheonan, South Korea. He has made significant contributions to the field of integrated circuit manufacturing through his innovative patent.
Latest Patents
Sangmoon Yun holds a patent titled "Etchant compositions and methods of manufacturing integrated circuit devices using the same." This patent describes etchant compositions that include components such as nitric acid, fluoric acid, phosphoric acid, acetic acid, a nitrogen compound, and water. The nitrogen compound may consist of fluorine (F), phosphorus (P), and/or carbon (C). The patent also outlines methods for manufacturing integrated circuit (IC) devices, which involve providing a structure where a silicon film doped at a first dopant concentration is stacked with an epitaxial film doped at a second dopant concentration. The second dopant concentration is different from the first, allowing for selective etching of the silicon film using the described etchant composition. Sangmoon Yun has 1 patent to his name.
Career Highlights
Throughout his career, Sangmoon Yun has worked with prominent companies in the technology sector. He has been associated with Samyoung Pure Chemicals Co., Ltd. and Samsung Electronics Co., Ltd., where he has contributed to advancements in chemical compositions and integrated circuit technologies.
Collaborations
Sangmoon Yun has collaborated with notable colleagues, including Youngtak Kim and Youngchan Kim. Their combined expertise has likely contributed to the innovative developments in their respective fields.
Conclusion
Sangmoon Yun's contributions to the field of integrated circuit manufacturing through his patent demonstrate his innovative spirit and dedication to advancing technology. His work continues to influence the industry and inspire future innovations.