Sangita Kumari

Title: Inventor Sangita Kumari: Pioneering Wet Etching Processes

Introduction

Sangita Kumari is an accomplished inventor based in Albany, NY, who has made significant contributions to the field of material etching technology. With a total of five patents to her name, her innovative work focuses on enhancing the uniformity and effectiveness of wet etching processes in various high aspect ratio applications.

Latest Patents

Sangita's recent patents demonstrate her expertise in developing methods for uniform wet etching of materials. One of her notable patents is titled "Methods to provide uniform wet etching of material within high aspect ratio features provided on a patterned substrate." This innovation involves a wet etching process designed to ensure uniformity while etching materials in high aspect ratio features like deep trenches and holes. The key to this method lies in achieving a neutral surface charge on the wall surfaces adjacent to the material being etched, ensuring effective etching.

Another important patent by her is titled "Methods to prevent surface charge induced CD-dependent etching of material formed within features on a patterned substrate." This patent addresses the challenges of uniform wet etching when critical dimensions (CD) of features are significantly smaller than the more planar regions of the substrate. By maintaining a neutral surface charge, this method achieves consistent results across various feature dimensions.

Career Highlights

Sangita Kumari is currently employed at Tokyo Electron Limited, a prominent company in the semiconductor equipment industry. Her role at the company has allowed her to utilize her expertise and bring innovative solutions to the field of material processing.

Collaborations

In her professional journey, Sangita has collaborated with skilled professionals, including her coworker, Peter Delia. Working alongside experienced colleagues has further enriched her contributions to developing cutting-edge processes in the etching technology sector.

Conclusion

Sangita Kumari's innovative work in wet etching processes has positioned her as a key figure in the realm of material science. With her patents, she continues to push the boundaries of technology, ensuring that advancements in etching methods are both effective and applicable to various high aspect ratio designs. Her contributions are poised to influence the future of semiconductor manufacturing and related industries.