Yongin, South Korea

Sanggyun Woo

This inventor holds 2 USPTO granted patents. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2004-2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sanggyun Woo. Retrieved from https://idiyas.com/inventor/sanggyun-woo-eseonssi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 50.0

Average Co-Inventor Count = 2.7

ph-index = 2

Forward Citations = 24(Granted Patents)


Company Filing History:


Years Active: 2004-2005

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2 patents (USPTO):Explore Patents

Title: Innovations of Sanggyun Woo in Semiconductor Technology

Introduction

Sanggyun Woo is a notable inventor based in Yongin, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the development of photosensitive polymers and resist compositions. With a total of 2 patents, his work has been instrumental in advancing the capabilities of photoresistive materials.

Latest Patents

Sanggyun Woo's latest patents include innovative methods and compositions that enhance the performance of semiconductor devices. One of his patents focuses on photosensitive polymers and resist compositions that incorporate a photoacid generator (PAG) and a photosensitive polymer. This polymer features a comonomer with an acid-labile substituent group or a polar functional group, along with a copolymer of alkyl vinyl ether and maleic anhydride. The copolymer is characterized by a specific structure where k is an integer ranging from 3 to 8, and X represents a tertiary cyclic alcohol with 7 to 20 carbon atoms.

Another significant patent involves a method for forming fine patterns through effective glass transition temperature reduction. This method is particularly useful for creating contact holes on semiconductor devices. It involves forming an ArF resist pattern and subsequently reducing the size of pattern openings by exposing the resist pattern to radiation from a VUV (vacuum ultraviolet) excimer laser or E-beam radiation during thermal treatment. This process temporarily reduces the temperature of the resist pattern, allowing it to flow and thereby decreasing the size of the spaces and openings in the pattern.

Career Highlights

Sanggyun Woo is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in the field of semiconductor technology. His work has not only contributed to the advancement of materials used in the industry but has also positioned him as a key figure in the development of next-generation semiconductor devices.

Collaborations

Throughout his career, Sanggyun Woo has collaborated with talented individuals such as Sangjun Choi and Joontae Moon. These collaborations have fostered an environment of innovation and have led to the successful development of new technologies in the semiconductor sector.

Conclusion

Sanggyun Woo's contributions to semiconductor technology through his patents and work at Samsung Electronics Co., Ltd. highlight his role as an influential inventor in the field. His innovative approaches to photosensitive polymers and

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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