This inventor holds 3 USPTO granted patents. Top assignee: Asml Masktools B.v.. Active years: 2006-2010.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2006-2010
Title: The Innovative Contributions of SangBong Park
Introduction
SangBong Park is a notable inventor based in Fremont, CA, who has made significant contributions to the field of lithography systems. With a total of 3 patents, his work focuses on optimizing processes for various lithography systems, enhancing the precision and efficiency of critical dimension calculations.
Latest Patents
One of SangBong Park's latest patents is a method of performing resist process calibration and optimization for providing optical proximity effect (OPE) matching between different lithography systems. This innovative method involves several steps, including determining a calibrated resist model for a specific process and target pattern using a first lithography system. It also includes selecting a second lithography system capable of being configured with various diffractive optical elements, simulating the imaging performance, and optimizing it through a genetic algorithm.
Another significant patent focuses on improving the calibration of resist models used in critical dimension (CD) calculations. This method involves obtaining a dose function based on the optical tool used for the resist on a wafer. The dose function is convolved with a convolution kernel to create a modified dose function, which is then converted into a CD value for comparison with a target value. Adjustments to the diffusion lengths of Gaussian kernels are made based on the comparison results, ensuring enhanced accuracy in CD calculations.
Career Highlights
SangBong Park is currently employed at ASML Masktools B.V., where he applies his expertise in lithography systems. His innovative approaches have contributed to advancements in the field, making him a valuable asset to his company and the industry.
Collaborations
SangBong Park has collaborated with notable coworkers, including Jang Fung Chen and Armin Liebchen. Their combined efforts have fostered a collaborative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
SangBong Park's contributions to the field of lithography systems through his patents and collaborative efforts highlight his role as an influential inventor. His work continues to pave the way for advancements in the industry, showcasing the importance of innovation in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile