The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2009
Filed:
Jan. 26, 2006
Jang Fung Chen, Cupertino, CA (US);
Gabriel Berger, Mill Valley, CA (US);
Tamer Coskun, Cupertino, CA (US);
Sangbong Park, Fremont, CA (US);
Ting Chen, Chandler, AZ (US);
Jang Fung Chen, Cupertino, CA (US);
Gabriel Berger, Mill Valley, CA (US);
Tamer Coskun, Cupertino, CA (US);
Sangbong Park, Fremont, CA (US);
Ting Chen, Chandler, AZ (US);
ASML Masktools B.V., Ah Veldhoven, NL;
Abstract
Improved calibration of a resist model used in critical dimension (CD) calculation is disclosed. A dose function is obtained based on optical tool to be used form the resist on a wafer. The dose function indicates the amount of energy in a resist. The dose function is convolved with a convolution kernel to obtain a modified dose function. The convolution kernel has variable diffusion lengths in different directions. The convolution kernel may include multiple Gaussian kernels each having variable diffusion lengths in different directions. The modified dose function is converted into a CD value which is compared with a target value. If necessary, the diffusion lengths of the Gaussian kernels are adjusted based on the comparison result.