This inventor holds 3 USPTO granted patents and 4 published patent applications. Top assignee: Semes Co., Ltd.. Active years: 2021-2022.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Cheonan-si, KR (2021)
- Chungcheongnam-do, KR (2022)
Company Filing History:
Years Active: 2021-2022
Title: Sang-Kee Lee: Innovator in Substrate Treatment Technologies
Introduction
Sang-Kee Lee is a prominent inventor based in Cheonan, South Korea. He has made significant contributions to the field of substrate treatment technologies, holding a total of 3 patents. His work focuses on developing advanced apparatuses and methods that enhance the efficiency and effectiveness of substrate processing.
Latest Patents
Sang-Kee Lee's latest patents include innovative designs for substrate treating apparatuses and methods. One of his notable inventions is a substrate treating apparatus that features a chamber with a treatment space, a support unit for substrates, a gas supply unit, and a plasma generating unit. This apparatus is designed to generate plasma from the supplied gas, improving the treatment process. Another patent describes a substrate support unit that includes a heating member and a heat transfer gas supply member, which work together to optimize the heating of the substrate during processing.
Career Highlights
Sang-Kee Lee is currently associated with Semes Co., Ltd., where he continues to push the boundaries of substrate treatment technology. His expertise and innovative approach have positioned him as a key figure in the industry, contributing to advancements that benefit various applications.
Collaborations
Sang-Kee Lee has collaborated with notable colleagues, including Harutyun Melikyan and Jong Hwan An. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Sang-Kee Lee's contributions to substrate treatment technologies exemplify his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in substrate processing, making him a valuable asset to the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
