The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2022
Filed:
Oct. 30, 2018
Semes Co., Ltd., Chungcheongnam-do, KR;
Harutyun Melikyan, Cheonan-Si, KR;
Jong Hwan An, Gyeonggi-do, KR;
Jamyung Gu, Chungcheongnam-do, KR;
Sang-Kee Lee, Chungcheongnam-do, KR;
Young Bin Kim, Gyeonggi-do, KR;
Shin-Woo Nam, Gyeonggi-do, KR;
SEMES CO., LTD., Chungcheongnam-do, KR;
Abstract
Disclosed is a substrate treating apparatus. The substrate treating apparatus includes a chamber having a treatment space in the interior thereof, a support unit configured to support a substrate in the treatment space, a gas supply unit configured to supply a gas into the treatment space, and a plasma generating unit configured to generate plasma from the gas, wherein the support unit includes an electrostatic chuck including an upper body having a support surface that suctions the substrate and a lower body extending from the upper body to a lower side, wherein the lower body has an extension part extending laterally from the upper body, a focus ring disposed on the extension part of the electrostatic chuck, and a metallic ring provided between the upper body of the electrostatic chuck and the focus ring and configured to control plasma in an extreme edge of the substrate.