Jong Hwan An

Title: **Innovative Contributions of Jong Hwan An in Substrate Treatment Technologies**

Introduction

Jong Hwan An, an accomplished inventor based in Gyeonggi-do, South Korea, has made significant strides in the field of substrate treatment technologies. With a total of seven patents to his name, his work showcases innovative advancements aimed at enhancing the efficiency and effectiveness of substrate processing.

Latest Patents

Among his latest contributions are two notable patents: the Filter Unit and the Substrate Treating Apparatus, along with its associated method. The filter unit is designed to prevent high-frequency inflow by incorporating a well-engineered housing, coils, and an adjustment member composed of non-magnetic material. This innovative design facilitates optimal functioning of the substrate treating apparatus, which comprises a chamber for substrate processing, a support unit, and different power sources to ensure effective treatment. The apparatus also includes a substrate processing method that employs a chuck member, an edge electrode, and a coupling compensator to regulate electric potentials effectively.

Career Highlights

Jong Hwan An has dedicated his expertise to the advancement of substrate treatment technologies while working at Semes Co., Ltd. His inventive insights into the design and functionality of substrate processing equipment have enhanced the capabilities of these technologies. With a focus on engineered precision, An has consistently contributed to pushing the boundaries of what is achievable in the substrate processing domain.

Collaborations

Throughout his career, An has collaborated with numerous talented individuals, including coworkers Shin-Woo Nam and Ogsen Galstyan. These collaborations have fostered an environment of creativity and innovation, as they share ideas and contribute to the collective progress within Semes Co., Ltd.

Conclusion

Jong Hwan An's inventive spirit and dedication to improvement in substrate treatment technologies demonstrate the importance of innovation within the field. His extensive patent portfolio stands as a testament to his contributions, paving the way for further advancements in substrate processing methodologies. As the industry evolves, An’s work will undoubtedly continue to influence future developments in this vital area of technology.