Gyeonggi-do, South Korea

Young Bin Kim

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Semes Co., Ltd.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Young Bin Kim. Retrieved from https://idiyas.com/inventor/young-bin-kim-q1e32o4o

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Young Bin Kim - Innovator in Substrate Treatment Technology

Introduction

Young Bin Kim is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of substrate treatment technology. His innovative approach has led to the development of a unique apparatus that enhances the efficiency of substrate processing.

Latest Patents

Young Bin Kim holds a patent for a substrate treating apparatus and method. This invention includes a chamber with a treatment space, a support unit for the substrate, a gas supply unit, and a plasma generating unit. The support unit features an electrostatic chuck designed to suction the substrate, ensuring optimal treatment conditions. The apparatus is engineered to control plasma at the edges of the substrate, which is crucial for precise substrate treatment.

Career Highlights

Young Bin Kim is currently employed at Semes Co., Ltd., where he continues to innovate in the field of substrate treatment. His work has been instrumental in advancing technologies that are essential for various applications in the semiconductor industry.

Collaborations

He collaborates with talented individuals such as Jong Hwan An and Harutyun Melikyan, contributing to a dynamic team focused on technological advancements.

Conclusion

Young Bin Kim's contributions to substrate treatment technology exemplify his commitment to innovation and excellence. His patent reflects a significant advancement in the field, showcasing his expertise and dedication to improving substrate processing methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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