Sang-Jin Jeong

Title: Sang-Jin Jeong: Innovator in Deposition Technology

Introduction

Sang-Jin Jeong is a notable inventor based in Cheonan, South Korea. He has made significant contributions to the field of deposition technology, holding a total of 4 patents. His work focuses on improving the efficiency and uniformity of thin film deposition processes.

Latest Patents

One of his latest patents is a deposition apparatus and cleansing method using the same. This invention includes a connection channel that links a gas inflow channel and a gas outflow channel. It enhances cleaning efficiency by directing a portion of cleaning gas to the dead space of the gas inflow channel while controlling the flow of the cleaning gas. Another significant patent is the lateral flow atomic layer deposition apparatus and atomic layer deposition method using the same. This apparatus features two gas inflow channels and two gas outflow channels, symmetrically arranged around a substrate. This design allows for a more controlled flow direction of gases, resulting in improved uniformity of the deposited film compared to conventional methods.

Career Highlights

Sang-Jin Jeong has worked with prominent companies in the industry, including ASM IP Holding B.V. and ASM IP Holdings B.V. His experience in these organizations has contributed to his expertise in deposition technologies.

Collaborations

He has collaborated with notable coworkers such as Hyun Soo Jang and Jeong Ho Lee, further enhancing his innovative work in the field.

Conclusion

Sang-Jin Jeong's contributions to deposition technology through his patents and collaborations highlight his role as a key innovator in the industry. His inventions continue to influence the efficiency and effectiveness of thin film deposition processes.