The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2018
Filed:
Jan. 03, 2017
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Dae Youn Kim, Daejeon, KR;
Sang-Jin Jeong, Cheonan, KR;
Hyun Soo Jang, Daejeon, KR;
Young Hoon Kim, Cheonan, KR;
Jeong Ho Lee, Seoul, KR;
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); B08B 5/00 (2006.01); B07B 7/00 (2006.01); C23C 16/44 (2006.01); B08B 9/093 (2006.01); H01L 21/02 (2006.01); B08B 7/00 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45591 (2013.01); B08B 5/00 (2013.01); B08B 7/00 (2013.01); B08B 9/093 (2013.01); C23C 16/4405 (2013.01); C23C 16/45502 (2013.01); C23C 16/45561 (2013.01); C23C 16/45574 (2013.01); H01L 21/02046 (2013.01);
Abstract
Provided is a deposition apparatus including a connection channel connecting a gas inflow channel and a gas outflow channel so as to increase cleaning efficiency by providing a portion of cleaning gas to the dead space of the gas inflow channel and controlling a flow of a cleaning gas.