Company Filing History:
Years Active: 1988-1993
Title: Discovering the Innovations of Inventor Sandra S. Lee
Introduction
Sandra S. Lee, an accomplished inventor based in Los Altos, California, has made significant contributions to the field of semiconductor technology. With a total of four patents to her name, Lee is recognized for her innovative approaches to enhancing the performance and efficiency of electronic devices. Currently working at Intel Corporation, she continues to push the boundaries of engineering through her groundbreaking inventions.
Latest Patents
Sandra S. Lee's most recent patents include the "Masking Technique for Depositing Gallium Arsenide on Silicon" and the "Source Drain Doping Technique." The first patent focuses on a process for forming gallium arsenide (GaAs) on silicon substrates while minimizing unintentional silicon doping. This is achieved by growing a dielectric layer on the substrate and strategically opening a window to expose the area where GaAs is intended to be formed. The innovative use of dielectric layers helps inhibit the contamination of the GaAs layer.
Her second patent presents a method for fabricating metal oxide semiconductor field-effect transistors (MOSFETs). This technique involves ion implantation for the source and drain regions, making the process more efficient and effective. By establishing impurity concentrations that vary laterally away from the gate electrode, the method enhances performance indicators such as hot electron injection suppression, channeling effect minimization, increased punch-through voltage, and improved gate-aided breakdown voltage.
Career Highlights
Throughout her career at Intel Corporation, Sandra S. Lee has become known not only for her patents but also for her dedication to advancing technology in the semiconductor industry. Her work has contributed to significant improvements in the manufacturing processes of electronic components, helping to drive performance and reliability in consumer electronics.
Collaborations
Sandra has collaborated with esteemed colleagues such as Been-Jon K Woo and Mark A Holler. These partnerships reflect a spirit of teamwork and innovation, fostering an environment where groundbreaking ideas can flourish. The synergy between these talented individuals has undoubtedly led to advancements beneficial to the semiconductor sector.
Conclusion
With her impressive portfolio of patents and collaborative spirit, Sandra S. Lee stands out as a key figure in the world of technology and innovation. Her contributions continue to shape the future of electronics, solidifying her reputation as an influential inventor at Intel Corporation. Thanks to her work, the semiconductor industry is better equipped to tackle the challenges of tomorrow.