Milan, Italy

Salvatore Coffa

This inventor holds 3 USPTO granted patents. Top assignee: Stmicroelectronics International N.v.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Salvatore Coffa. Retrieved from https://idiyas.com/inventor/salvatore-coffa-vzltlbo9

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 33.3

Average Co-Inventor Count = 5.3

ph-index = 1


Company Filing History:


Years Active: 2026

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3 patents (USPTO):Explore Patents

Title: Salvatore Coffa: Innovator in Machine Learning for Wafer Defect Classification

Introduction

Salvatore Coffa is a notable inventor based in Milan, Italy. He has made significant contributions to the field of machine learning, particularly in the classification of wafer defect maps. His innovative approach has the potential to enhance the efficiency and accuracy of defect detection in semiconductor manufacturing.

Latest Patents

Salvatore Coffa holds a patent for "Machine learning techniques for wafer defect map classification." This patent outlines various embodiments that provide methods, apparatus, systems, and computing devices for generating classification predictions for wafer defect maps. The invention involves generating reduced feature data using a non-linear dimensionality reduction machine learning model, based on vector representations for a set of wafer defect map images. Additionally, it includes generating one or more wafer defect pattern clusters using a density-based clustering machine learning model, which is based on the reduced feature data. Each wafer defect map image is associated with a specific wafer defect pattern cluster, allowing for accurate classification predictions.

Career Highlights

Salvatore Coffa is currently employed at STMicroelectronics International N.V., where he applies his expertise in machine learning to advance semiconductor technology. His work focuses on improving the processes involved in wafer defect detection and classification, which is crucial for maintaining high-quality standards in semiconductor production.

Collaborations

Salvatore has collaborated with talented coworkers, including Daniele Riccardo Vinciguerra and Francesco Rundo. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies in the field.

Conclusion

Salvatore Coffa's contributions to machine learning and wafer defect classification exemplify the impact of innovative thinking in technology. His patent and work at STMicroelectronics International N.V. highlight the importance of advancements in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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