Chesterfield, MO, United States of America

Sadasivam Chandrasekhar

This inventor holds 5 USPTO granted patents. Top assignee: Memc Electronic Materials, Inc.. Active years: 1996-1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sadasivam Chandrasekhar. Retrieved from https://idiyas.com/inventor/sadasivam-chandrasekhar

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.6

ph-index = 4

Forward Citations = 48(Granted Patents)


Location History:

  • Chesterfield, MO (US) (1996 - 1998)
  • St. Louis, MO (US) (1999)

Company Filing History:


Years Active: 1996-1999

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5 patents (USPTO):Explore Patents

Title: Sadasivam Chandrasekhar: Innovator in Silicon Growth Technologies

Introduction

Sadasivam Chandrasekhar is a notable inventor based in Chesterfield, MO (US). He has made significant contributions to the field of silicon growth technologies, holding a total of 5 patents. His work focuses on improving the processes involved in the production of single crystal silicon, which is essential for various applications in electronics and materials science.

Latest Patents

Chandrasekhar's latest patents include innovative methods and apparatuses that enhance the quality and efficiency of silicon crystal growth. One of his key inventions is the "Non-dash neck method for single crystal silicon growth." This method allows for the preparation of a single crystal silicon rod using the Czochralski method. The process is designed to prevent the formation of dislocations by thermally equilibrating a large diameter, dislocation-free seed crystal before initiating growth. Additionally, a resistance heater is employed to melt the lower tip of the seed crystal, ensuring a smooth transition into the silicon melt.

Another significant patent is the "Apparatus for controlling nucleation of oxygen precipitates in silicon." This apparatus is crucial for producing high-quality silicon single crystals. It features a hollow growth chamber and a quartz crucible, along with a pulling member that elevates the growing crystal from the silicon melt. The design includes heating members that control the formation of oxygen precipitate nucleation centers, thereby enhancing the purity and structural integrity of the crystal.

Career Highlights

Chandrasekhar is currently associated with Memc Electronic Materials, Inc., where he continues to innovate in the field of silicon materials. His expertise and inventions have contributed to advancements in semiconductor manufacturing and materials science.

Collaborations

Throughout his career, Sadasivam Chandrasekhar has collaborated with esteemed colleagues, including Kyong-Min Kim and Harold W. Korb. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Sadasivam Chandrasekhar's contributions to silicon growth technologies have made a significant impact on the industry. His innovative patents and collaborative efforts continue to advance the field, ensuring the development of high-quality materials for future applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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