Sadao Hisakado

Title: Sadao Hisakado: Innovator in Semiconductor Processing

Introduction

Sadao Hisakado is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor processing, holding a total of 5 patents. His innovative techniques have advanced the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Hisakado's latest patents include a method of cleaning a member in a process container, a method of manufacturing a semiconductor device, a substrate processing apparatus, and a recording medium. The cleaning method involves a cycle that includes separately supplying a cleaning gas and an additive gas from different supply parts into the process container. This technique enhances the cleaning process by ensuring that at least one of the gases is supplied from different supply parts during the cycle. The substrate processing apparatus he developed features a substrate retainer, a heat insulating assembly, and a gas supplier with openings directed toward the wafer, among other components. This design aims to improve the overall efficiency of substrate processing.

Career Highlights

Throughout his career, Sadao Hisakado has worked with notable companies such as Hitachi Kokusai Electric Inc. and Kokusai Electric Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Hisakado has collaborated with esteemed colleagues, including Tomoshi Taniyama and Takashi Ozaki. These partnerships have fostered a creative environment that has led to innovative solutions in the semiconductor industry.

Conclusion

Sadao Hisakado's contributions to semiconductor processing through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the industry and pave the way for future advancements.