Company Filing History:
Years Active: 1996-2007
Title: Innovations of Sachiko Nakamura
Introduction
Sachiko Nakamura is a notable inventor based in Amagasaki, Japan. He has made significant contributions to the field of resin surface treatment and micro-etching compositions. With a total of 3 patents, his work has advanced the technology used in various applications, particularly in the manufacturing of printed circuit boards.
Latest Patents
Nakamura's latest patents include a resin surface treating agent and a resin surface treatment method. This invention involves a resin surface treating agent that contains at least one cerium compound selected from tetravalent and trivalent cerium compounds. The method enhances the adhesion strength of polyimide-based resin films with metal wires and other resins. Another significant patent is a micro-etching composition for copper or copper alloys, which utilizes sulfuric acid and hydrogen peroxide as main ingredients. This composition allows for the continuous treatment of copper surfaces, creating fine microscopic pits that improve adhesion to resins without leaving undesirable deposits.
Career Highlights
Nakamura is currently associated with Mec Company Ltd., where he continues to innovate and develop new technologies. His work has been instrumental in improving productivity and reducing processing costs in resin treatment applications.
Collaborations
He has collaborated with notable coworkers, including Yoshiro Maki and Toshiko Nakagawa, who contribute to the innovative environment at Mec Company Ltd.
Conclusion
Sachiko Nakamura's contributions to resin surface treatment and micro-etching compositions highlight his role as a leading inventor in his field. His patents not only advance technology but also enhance manufacturing processes, showcasing the importance of innovation in industry.