Company Filing History:
Years Active: 2009-2019
Title: Sachiko Kato: Innovator in Silica Glass Technology
Introduction
Sachiko Kato is a prominent inventor based in Hadano, Japan. She has made significant contributions to the field of silica glass technology, particularly in applications related to photolithography. With a total of 2 patents, her work has garnered attention for its innovative approaches and practical applications.
Latest Patents
Kato's latest patents include a silica glass member and a method of manufacturing the same. This silica glass member exhibits high optical transparency to vacuum ultraviolet light and has a low thermal expansion coefficient of 4.0×10/K or less at near room temperature. It is particularly suitable as a photomask substrate for use in a double patterning exposure process utilizing an ArF excimer laser (193 nm) as a light source. Additionally, she has developed titania-silica glass, which is transparent and has a low thermal expansion coefficient over a wide temperature range of 0 to 100°C. This material is especially useful as a photomask or mirror material in extreme ultraviolet ray lithography.
Career Highlights
Throughout her career, Kato has worked with notable companies such as Covalent Materials Corporation and Coorstek KK. Her expertise in silica glass technology has positioned her as a key player in the industry, contributing to advancements that enhance the performance of photolithography processes.
Collaborations
Kato has collaborated with esteemed colleagues, including Masanobu Ezaki and Masashi Kobata. These partnerships have fostered innovation and have been instrumental in the development of her patented technologies.
Conclusion
Sachiko Kato's contributions to silica glass technology reflect her dedication to innovation and excellence. Her patents not only advance the field but also pave the way for future developments in photolithography.