Shibata, Japan

Ryuji Takeda

This inventor holds 2 USPTO granted patents. Top assignees: Toshiba Ceramics Co., Ltd., Kabushiki Kaisha Toshiba, Purex Co., Ltd.. Active years: 1998-2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryuji Takeda. Retrieved from https://idiyas.com/inventor/ryuji-takeda-m73vpdoj

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 35(Granted Patents)


Location History:

  • Kanagawa, JP (1998)
  • Shibata, JP (2000)

Company Filing History:


Years Active: 1998-2000

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2 patents (USPTO):Explore Patents

Title: Ryuji Takeda: Innovator in Semiconductor Technology

Introduction

Ryuji Takeda is a notable inventor based in Shibata, Japan. He has made significant contributions to the field of semiconductor technology, holding two patents that address critical challenges in the industry. His work focuses on methods for removing metallic impurities from semiconductor substrates, which is essential for enhancing the performance and reliability of electronic devices.

Latest Patents

Ryuji Takeda's latest patents include a method and apparatus for removing metallic impurities diffused in a semiconductor substrate. This innovative method involves heating the semiconductor substrate to at least 200 degrees Celsius to promote the release and rediffusion of metallic impurities. The process also includes a step for dissolving these impurities with a chemical agent and removing them from the substrate. Another significant patent is for a manufacturing method of a silicon wafer that has controlled bulk microdefects (BMD). This method involves a heat treatment in a controlled atmosphere while carefully managing temperature to ensure optimal conditions for nuclei growth.

Career Highlights

Throughout his career, Ryuji Takeda has worked with prominent companies in the semiconductor industry, including Toshiba Ceramics Co., Ltd. and Kabushiki Kaisha Toshiba. His experience in these organizations has allowed him to develop and refine his innovative techniques, contributing to advancements in semiconductor manufacturing.

Collaborations

Ryuji Takeda has collaborated with notable colleagues in his field, including Kenro Hayashi and Katsuhiro Chaki. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise, further enhancing the impact of their work.

Conclusion

Ryuji Takeda's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His innovative methods for improving semiconductor substrates are vital for the advancement of electronic devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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