The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 1998
Filed:
Mar. 07, 1996
Applicant:
Inventors:
Kenro Hayashi, Kanagawa, JP;
Ryuji Takeda, Kanagawa, JP;
Katsuhiro Chaki, Kanagawa, JP;
Ping Xin, Kanagawa, JP;
Jun Yoshikawa, Kanagawa, JP;
Hiroyuki Saito, Kanagawa, JP;
Assignee:
Toshiba Ceramics Co., Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C30B / ;
U.S. Cl.
CPC ...
117-2 ; 117-4 ; 117 20 ; 117932 ; 438146 ; 438147 ;
Abstract
In a heat history initializing step, a heat treatment in performed in an atmosphere including at least one of hydrogen, helium, and argon while the temperature is increased in a range of 700.degree. C. to 1,000.degree. C. at a rate of 15.degree.-1,000.degree. C./min. In a controlled nuclei growing step, a heat treatment is performed in the above atmosphere while the temperature is kept constant in a range of 850.degree. C. to 980.degree. C. for 0.5-60 minutes.