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For the Inventor, By the Inventor

Kyoto, Japan

Ryuji Okamura

USPTO Granted Patents = 49

Average Co-Inventor Count = 3.9

ph-index = 13

Forward Citations = 827(Granted Patents)


Location History:

  • Ika, JP (1991 - 1993)
  • Shiga, JP (1990 - 1996)
  • Shiga-ken, JP (1997)
  • Nara, JP (1995 - 1998)
  • Soraku-gun, JP (2000 - 2001)
  • Souraku-gun, JP (2000 - 2002)
  • Kyoto-fu, JP (2001 - 2003)
  • Kyoto, JP (2000 - 2005)
  • Mishima, JP (2001 - 2006)
  • Shizuoka, JP (2003 - 2006)

Company Filing History:

goldMedal49 out of 90,594 
 
Canon Kabushiki Kaisha
 patents

Years Active: 1990-2006

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49 patents (USPTO):Explore Patents
1. 7060406 - Light-receiving member, image-forming apparatus, and image-forming method (2006-06-13),
2. 7033721 - Method for producing electrophotographic photosensitive member, electrophotographic photosensitive member and electrophotographic apparatus using the same (2006-04-25),
3. 7033717 - Process for producing electrophotographic photosensitive member, and electrophotographic photosensitive member and electrophotographic apparatus making use of the same (2006-04-25),
4. 6946167 - Deposited film forming apparatus and deposited film forming method (2005-09-20),
5. 6846600 - Electrophotographic photosensitive member, process for its production, and electrophotographic apparatus (2005-01-25),
6. 6753123 - Process and apparatus for manufacturing electrophotographic photosensitive member (2004-06-22),
7. 6702898 - Deposited film forming apparatus (2004-03-09),
8. 6649020 - Plasma processing apparatus (2003-11-18),
9. 6645688 - Image-forming apparatus and image-forming method (2003-11-11),
10. 6635397 - Negative-charging electrophotographic photosensitive member (2003-10-21),
11. 6586149 - Light-receiving member, image-forming apparatus, and image-forming method (2003-07-01),
12. 6576387 - Image-forming apparatus and image-forming method (2003-06-10),
13. 6528130 - Exhaust process and film depositing method using the exhaust process (2003-03-04),
14. 6500500 - Method for forming a deposited film by plasma chemical vapor deposition (2002-12-31),
15. 6413592 - Apparatus for forming a deposited film by plasma chemical vapor deposition (2002-07-02),

Title: The Innovative Mind of Ryuji Okamura

Introduction: Ryuji Okamura is a renowned inventor hailing from Kyoto, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Ryuji Okamura holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his versatility and forward-thinking approach to invention.

Career Highlights: With a career spanning over two decades, Ryuji Okamura has worked with leading research institutions and tech companies, spearheading projects that have revolutionized industries and improved the quality of life for many.

Collaborations: Throughout his career, Ryuji Okamura has collaborated with top engineers, scientists, and designers from around the world, fostering a culture of innovation and excellence in all his projects.

Conclusion: Ryuji Okamura's passion for pushing the boundaries of what is possible through innovation and invention continues to inspire the next generation of inventors and creators worldwide.

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