The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 25, 2006

Filed:

Jul. 31, 2003
Applicants:

Junichiro Hashizume, Shizuoka, JP;

Toshiyuki Ehara, Kanagawa, JP;

Hideaki Matsuoka, Shizuoka, JP;

Ryuji Okamura, Shizuoka, JP;

Koji Hitsuishi, Shizuoka, JP;

Satoshi Kojima, Shizuoka, JP;

Hironori Ohwaki, Shizuoka, JP;

Kazuto Hosoi, Shizuoka, JP;

Inventors:

Junichiro Hashizume, Shizuoka, JP;

Toshiyuki Ehara, Kanagawa, JP;

Hideaki Matsuoka, Shizuoka, JP;

Ryuji Okamura, Shizuoka, JP;

Koji Hitsuishi, Shizuoka, JP;

Satoshi Kojima, Shizuoka, JP;

Hironori Ohwaki, Shizuoka, JP;

Kazuto Hosoi, Shizuoka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G 5/082 (2006.01); C23C 16/22 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention provides a method for producing an electrophotographic photosensitive member such that even if abnormal grown portions called spherical protrusionsexist on the surface of the photosensitive member, they do not appear on images, thus making it possible to considerably alleviate image defects. The method for producing the electrophotographic photosensitive member including layers each constituted by a non-single crystal material includes the steps of placing a substrate having a conductive surface in a film forming apparatus capable of being airtight-sealed under vacuum having evacuating means and raw material gas supplying means, and decomposing at least a raw material gas by a high frequency power to form a first layer constituted by at least a non-single crystal material on the substrate as a first step; exposing the substrate with the first layer formed thereon to a gas containing oxygen and water vapor as a second step; and decomposing at least a raw material gas by a high frequency power in the film forming apparatus to form on the first layer a second layer including an upper blocking layer constituted by a non-single crystal material as a third step.


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