This inventor holds 1 USPTO granted patent. Top assignees: Asahi Kasei Kogyo Kabushiki Kaisha, Nippon Mining Co., Ltd.. Active years: 1983.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 1983
Title: Ryuichi Ishizuka: Innovator in Plasma Reactor Technology
Introduction
Ryuichi Ishizuka is a notable inventor based in Tama, Japan. He has made significant contributions to the field of plasma technology, particularly with his innovative designs for plasma reactors. His work has implications for various industrial applications, showcasing the potential of high-frequency plasma flames.
Latest Patents
Ishizuka holds a patent for a "High frequency magnetic field coupling arc plasma reactor." This plasma reactor is developed based on the principle that a high-frequency plasma flame has a larger volume and lower velocity, allowing reaction materials to remain within the reactor for an extended period. The design features a d.c. arc plasma torch located at the upper part of an electrically insulative pipe, which is resistant to heat and corrosion. Additionally, the reactor includes a continuously introducing pipe for reaction materials and a high-frequency coil wound coaxially around the pipe.
Career Highlights
Throughout his career, Ryuichi Ishizuka has worked with prominent companies such as Nippon Mining Co., Ltd. and Asahi Kasei Kogyo Kabushiki Kaisha. His experience in these organizations has contributed to his expertise in plasma technology and reactor design.
Collaborations
Ishizuka has collaborated with notable colleagues, including Kazuo Akashi and Toyonobu Yoshida. These partnerships have likely enhanced his research and development efforts in the field of plasma reactors.
Conclusion
Ryuichi Ishizuka's contributions to plasma technology through his innovative reactor designs highlight his role as a significant inventor in this field. His work continues to influence advancements in industrial applications of plasma technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile