The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 31, 1983

Filed:

Jul. 13, 1981
Applicant:
Inventors:

Kazuo Akashi, Matsudo, JP;

Toyonobu Yoshida, Tokyo, JP;

Ryuichi Ishizuka, Tama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K / ;
U.S. Cl.
CPC ...
2191 / ; 31511121 ; 31511151 ; 2191 / ; 2191 / ; 2191 / ;
Abstract

A plasma reactor is developed on the fact that a high frequency plasma flame is larger in volume and lower in velocity and therefore a reaction material can stay therein for a relatively long period of time. The plasma reactor has a d.c. arc plasma torch provided in the upper part of the pipe which is an electrically insulative pipe high in heat-resistance and corrosion-resistance or is made up of electrically conductive components which are so designed as to prevent magnetic induction, a reaction material continuously introducing pipe opened in the vicinity of the arc plasma jet from the torch, and a high frequency coil wound around the firstly mentioned pipe coaxially with the torch.


Find Patent Forward Citations

Akashi, Kazuo. (1983). High frequency magnetic field coupling arc plasma reactor (U.S. Patent No. 4386258). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4386258

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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