Annaka, Japan

Ryuichi Handa

This inventor holds 9 USPTO granted patents and 2 EPO patents. Top assignees: Shin-Etsu Chemical Co., Ltd., Other. Active years: 1992-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryuichi Handa. Retrieved from https://idiyas.com/inventor/ryuichi-handa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 66.7


Average Co-Inventor Count = 2.9

ph-index = 5

Forward Citations = 91(Granted Patents)


Location History:

  • Gunma-ken, JP (2000 - 2004)
  • Annaka, JP (1992 - 2010)
  • Gunma, JP (2011)

Company Filing History:


Years Active: 1992-2011

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9 patents (USPTO):Explore Patents

Title: Ryuichi Handa: Innovator in Electrostatic Chuck Technology

Introduction

Ryuichi Handa is a prominent inventor based in Annaka, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative designs of electrostatic chucks. With a total of 9 patents to his name, Handa's work has greatly influenced the efficiency and performance of semiconductor integrated circuits.

Latest Patents

One of Handa's latest patents is an advanced electrostatic chuck designed to hold substrates during the manufacturing process of semiconductor integrated circuits. This invention boasts excellent cooling performance and insulation capabilities while minimizing particulate generation. The electrostatic chuck comprises a metal substrate, a first insulating layer made of silicone rubber with a thermal conductivity of 0.5 W/mK or more, and an electrically conducting pattern. Additionally, it features a second insulating layer of insulating polyimide film and a third insulating layer of silicone rubber containing reinforcing silica, ensuring optimal performance without thermally conductive fillers of significant particle size.

Another notable patent involves an electrostatic chuck that includes an insulating layer with an embedded electrode. This design allows for intimate contact with the workpiece, enhancing cooling capacity. The surface of the insulating layer is coated with a silicone rubber layer filled with reinforcing silica, ensuring high performance in semiconductor applications.

Career Highlights

Ryuichi Handa has worked with notable companies, including Shin-Etsu Chemical Co., Ltd. His experience in the industry has allowed him to develop cutting-edge technologies that address the challenges faced in semiconductor manufacturing.

Collaborations

Handa has collaborated with esteemed colleagues such as Kazuhiko Tomaru and Tsutomu Yoneyama. Their combined expertise has contributed to the advancement of electrostatic chuck technology.

Conclusion

Ryuichi Handa's innovative work in electrostatic chuck technology has made a significant impact on the semiconductor industry. His patents reflect a commitment to enhancing manufacturing processes and improving product quality.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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