Company Filing History:
Years Active: 2006
Title: Ryouji Fukuyama: Innovator in Etching Processing Technology
Introduction
Ryouji Fukuyama is a notable inventor based in Kudamatsu, Japan. He has made significant contributions to the field of etching processing technology, holding a total of 3 patents. His work focuses on methods that enhance the efficiency and cost-effectiveness of etching processes, particularly for low dielectric constant materials.
Latest Patents
Fukuyama's latest patents include an innovative etching processing method. This method is designed to etch a low dielectric constant layer at a reduced cost. It utilizes an etching processing apparatus that comprises a vacuum vessel, a sample loading electrode, a gas introduction device, an antenna for plasma formation, and a high-frequency power supply. The method specifies that the bias power supplied to the sample should be 3 W/cm or less, with the gas introduction device introducing a gas containing chlorine or bromine atoms to etch inorganic insulation materials.
Another significant patent is his etching aftertreatment method. This process involves treating a Si-containing low permittivity insulating film with chlorine-based gas. After etching, the wafer undergoes an aftertreatment process that includes introducing oxygen gas into a vacuum processing chamber at low pressure and flow rates. The wafer is then subjected to plasma generation and heating, which effectively removes photoresist components and other materials.
Career Highlights
Ryouji Fukuyama is currently employed at Hitachi High-Technologies Corporation, where he continues to develop advanced technologies in the field of etching processing. His work has been instrumental in improving the manufacturing processes for semiconductor devices.
Collaborations
Fukuyama has collaborated with notable colleagues, including Yutaka Ohmoto and Mamoru Yakushiji. Their combined expertise has contributed to the advancement of etching technologies and the successful implementation of innovative methods in the industry.
Conclusion
Ryouji Fukuyama's contributions to etching processing technology have established him as a key figure in the field. His innovative patents and collaborative efforts continue to influence advancements in semiconductor manufacturing.