Koshi, Japan

Ryouichirou Naitou

USPTO Granted Patents = 9 

Average Co-Inventor Count = 3.7

ph-index = 2

Forward Citations = 8(Granted Patents)


Location History:

  • Kumamoto, JP (2008 - 2023)
  • Koshi, JP (2017 - 2023)

Company Filing History:


Years Active: 2008-2023

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9 patents (USPTO):Explore Patents

Title: Ryouichirou Naitou: Innovator in Substrate Processing Technologies

Introduction

Ryouichirou Naitou is a prominent inventor based in Koshi, Japan. He has made significant contributions to the field of substrate processing, holding a total of 9 patents. His innovative work focuses on developing advanced apparatuses and methods that enhance the efficiency and effectiveness of substrate processing.

Latest Patents

Naitou's latest patents include a substrate processing apparatus, a substrate processing method, and a recording medium. The substrate processing apparatus features a nozzle designed for discharging a processing solution, along with a processing solution supply part that includes a tank, a conduit, a pump, and a filter. The controller in this apparatus performs a dual control process to manage the flow of the processing solution through the filtering member. Additionally, he has developed a treatment apparatus that performs a developing treatment on a substrate, which includes a rotating and holding part, a discharger for applying a solution, and a destaticizer that utilizes X-ray ionization to enhance the treatment process.

Career Highlights

Ryouichirou Naitou is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has allowed him to push the boundaries of substrate processing technology, contributing to advancements that benefit various applications in the field.

Collaborations

Throughout his career, Naitou has collaborated with notable colleagues, including Yuichi Yoshida and Toshinobu Furusho. These partnerships have fostered an environment of innovation and creativity, leading to the development of cutting-edge technologies.

Conclusion

Ryouichirou Naitou's contributions to substrate processing technologies exemplify his dedication to innovation and excellence. His patents and collaborative efforts continue to influence the industry, showcasing the importance of research and development in advancing technology.

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