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For the Inventor, By the Inventor

Kikuchi, Japan

Ryouichi Uemura

This inventor holds 9 USPTO granted patents and 1 published patent application. Top assignee: Tokyo Electron Limited. Active years: 2002-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryouichi Uemura. Retrieved from https://idiyas.com/inventor/ryouichi-uemura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 9 

% Patents Active = 44.4

Average Co-Inventor Count = 4.7

ph-index = 4

Forward Citations = 57(Granted Patents)


Location History:

  • Kumamoto-Ken, JP (2002 - 2006)
  • Kumamoto, JP (2005 - 2006)
  • Kikuchi-gun, JP (2004 - 2012)

Company Filing History:

goldMedal9 out of 10,883 
 
Tokyo Electron Limited
 patents

Years Active: 2002-2012

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9 patents (USPTO):Explore Patents
1. 8231285 - Substrate processing method and apparatus (2012-07-31),
2. 7780366 - Resist pattern forming method (2010-08-24),
3. 7488127 - Resist pattern forming apparatus and method thereof (2009-02-10),
4. 7031792 - Processing apparatus and information storage apparatus and method (2006-04-18),
5. 6990380 - Substrate processing apparatus and information storage apparatus and method (2006-01-24),
6. 6984477 - Resist pattern forming apparatus and method thereof (2006-01-10),
7. 6974963 - Substrate inspecting device, coating/developing device and substrate inspecting method (2005-12-13),
8. 6766209 - Managing system, managing method, host computer, and information collecting/transmitting unit (2004-07-20),
9. 6457882 - Substrate processing method and substrate processing apparatus (2002-10-01),

Title: Ryouichi Uemura: Innovator in Substrate Processing Technologies

Introduction

Ryouichi Uemura is a prominent inventor based in Kikuchi-gun, Japan. He has made significant contributions to the field of substrate processing, holding a total of nine patents. His work focuses on improving the efficiency and accuracy of resist pattern forming methods, which are crucial in various manufacturing processes.

Latest Patents

Uemura's latest patents include a substrate processing method and apparatus that enhances the resist pattern forming process. This innovative method utilizes a coating and developing apparatus, along with an aligner, to create a resist film on a substrate with a base film and a base pattern. The process involves inspecting multiple measurement items, such as the reflection ratio and film thickness of both the base and resist films, as well as the line width after development. By selecting parameters for amendment based on the data collected, Uemura's method reduces the workload for operators and ensures appropriate adjustments are made.

Career Highlights

Ryouichi Uemura is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing industry. His expertise in substrate processing has positioned him as a key figure in the development of advanced manufacturing technologies. Uemura's innovative approaches have not only improved operational efficiency but have also contributed to the overall advancement of the industry.

Collaborations

Uemura has collaborated with notable colleagues, including Kunie Ogata and Michio Tanaka. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Ryouichi Uemura's contributions to substrate processing technologies exemplify the impact of innovation in the manufacturing sector. His patents and collaborative efforts continue to shape the future of resist pattern forming methods, making significant strides in operational efficiency and accuracy.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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