Location History:
- Kumamoto-Ken, JP (2002 - 2006)
- Kumamoto, JP (2005 - 2006)
- Kikuchi-gun, JP (2004 - 2012)
Company Filing History:
Years Active: 2002-2012
Title: Ryouichi Uemura: Innovator in Substrate Processing Technologies
Introduction
Ryouichi Uemura is a prominent inventor based in Kikuchi-gun, Japan. He has made significant contributions to the field of substrate processing, holding a total of nine patents. His work focuses on improving the efficiency and accuracy of resist pattern forming methods, which are crucial in various manufacturing processes.
Latest Patents
Uemura's latest patents include a substrate processing method and apparatus that enhances the resist pattern forming process. This innovative method utilizes a coating and developing apparatus, along with an aligner, to create a resist film on a substrate with a base film and a base pattern. The process involves inspecting multiple measurement items, such as the reflection ratio and film thickness of both the base and resist films, as well as the line width after development. By selecting parameters for amendment based on the data collected, Uemura's method reduces the workload for operators and ensures appropriate adjustments are made.
Career Highlights
Ryouichi Uemura is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing industry. His expertise in substrate processing has positioned him as a key figure in the development of advanced manufacturing technologies. Uemura's innovative approaches have not only improved operational efficiency but have also contributed to the overall advancement of the industry.
Collaborations
Uemura has collaborated with notable colleagues, including Kunie Ogata and Michio Tanaka. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Ryouichi Uemura's contributions to substrate processing technologies exemplify the impact of innovation in the manufacturing sector. His patents and collaborative efforts continue to shape the future of resist pattern forming methods, making significant strides in operational efficiency and accuracy.