This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2016.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2016
Title: The Innovative Contributions of Ryota Yoshida
Introduction
Ryota Yoshida is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique plasma processing method and apparatus.
Latest Patents
Ryota Yoshida holds a patent for a plasma processing method and plasma processing apparatus. This method involves performing plasma processing while the object is held on an electrostatic chuck by applying a first voltage. A thermal conduction gas is supplied to the gap between the electrostatic chuck and the object. Upon completion of the plasma processing, the application voltage is decreased, and the thermal conduction gas is exhausted. Finally, the object is separated from the electrostatic chuck by setting the application voltage to zero.
Career Highlights
Ryota Yoshida is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at this company has allowed him to further develop his expertise in plasma processing technologies.
Collaborations
Ryota has collaborated with notable colleagues such as Toshiaki Fujisato and Takashi Sakuma. Their teamwork has contributed to advancements in their field and has fostered a collaborative environment for innovation.
Conclusion
Ryota Yoshida's contributions to plasma processing technology exemplify the spirit of innovation. His patent and work at Tokyo Electron Limited highlight his role as a key figure in advancing this important technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile