logo

For the Inventor, By the Inventor

Utsunomiya, Japan

Ryota Makino

This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignee: Canon Kabushiki Kaisha. Active years: 2008-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryota Makino. Retrieved from https://idiyas.com/inventor/ryota-makino

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4 

% Patents Active = 75.0

Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 5(Granted Patents)


Company Filing History:

goldMedal4 out of 92,994 
 
Canon Kabushiki Kaisha
 patents

Years Active: 2008-2026

Loading Chart...
4 patents (USPTO):Explore Patents
1. 12693604 - Method of obtaining array of plurality of regions on substrate, exposure method, exposure apparatus, method of manufacturing article, non-transitory computer-readable storage medium, and information processing apparatus (2026-07-28),
2. 12092967 - Method of determining position of mark, lithography method, exposure apparatus, and article manufacturing method (2024-09-17),
3. 8625073 - Exposure apparatus and device manufacturing method (2014-01-07),
4. 7352520 - Holding device and exposure apparatus using the same (2008-04-01),

Title: Ryota Makino: Innovator in Lithography Technology

Introduction

Ryota Makino is a prominent inventor based in Utsunomiya, Japan. He has made significant contributions to the field of lithography, holding a total of 4 patents. His work focuses on methods and apparatuses that enhance the precision and efficiency of manufacturing processes.

Latest Patents

Makino's latest patents include a method of determining the position of a mark, a lithography method, and an exposure apparatus. The method of determining the position of a mark involves a first pattern arranged in a first layer of a substrate and a second pattern in a second layer. This method determines provisional position information based on an image of the mark and acquires relative position information between the two patterns. The position of the mark is then established using both sets of information.

The exposure apparatus patent describes a system that includes an optical system with a light shielding plate. This apparatus features a rotational drive unit that allows the light shielding plate to rotate along an optical path, as well as a shift drive unit that enables movement in a direction intersecting the axis of rotation. The control unit manages the positioning of the light shielding plate to ensure accurate projection of pattern images on substrates.

Career Highlights

Ryota Makino is currently employed at Canon Kabushiki Kaisha, a leading company in imaging and optical products. His innovative work has positioned him as a key figure in the development of advanced lithography technologies.

Collaborations

Makino has collaborated with notable colleagues such as Shinichi Hirano and Yukio Takabayashi. Their combined expertise has contributed to the advancement of lithography methods and technologies.

Conclusion

Ryota Makino's contributions to lithography and exposure apparatus design have significantly impacted the field. His innovative patents reflect his dedication to enhancing manufacturing processes and precision in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…