Saitama, Japan

Ryohei Osawa



Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Tokorozawa, JP (2015)
  • Saitama, JP (2018)

Company Filing History:


Years Active: 2015-2018

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2 patents (USPTO):Explore Patents

Title: Ryohei Osawa: Innovator in Semiconductor Technology

Introduction

Ryohei Osawa is a prominent inventor based in Saitama, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on developing advanced semiconductor devices that enhance performance and efficiency.

Latest Patents

Osawa's latest patents include a wide gap semiconductor device and a Schottky barrier diode. The wide gap semiconductor device features a first conductive-type semiconductor layer and a second conductive-type region, along with electrodes and insulating layers that optimize its functionality. The Schottky barrier diode incorporates a third insulating layer that electrically insulates the metal layer from the semiconductor layer, ensuring improved performance in electronic applications.

Career Highlights

Ryohei Osawa is currently employed at Shindengen Electric Manufacturing Company Limited, where he continues to innovate in the semiconductor sector. His expertise in semiconductor devices has positioned him as a key player in the industry, contributing to advancements that benefit various electronic applications.

Collaborations

Osawa collaborates with talented coworkers, including Yusuke Maeyama and Yoshitaka Araki. Their combined efforts in research and development have led to significant breakthroughs in semiconductor technology.

Conclusion

Ryohei Osawa's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to pave the way for advancements in electronic devices and systems.

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