Ryohei Maeno

Title: Ryohei Maeno: Innovator in Semiconductor Manufacturing

Introduction

Ryohei Maeno is a notable inventor based in Toyama, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 3 patents. His work focuses on improving the quality and manufacturing throughput of semiconductor devices.

Latest Patents

One of Ryohei Maeno's latest patents is a method of manufacturing semiconductor devices. This invention aims to enhance the quality or manufacturing throughput of semiconductor devices. The method involves supplying a source gas to a substrate in a process chamber, exhausting the inside of the process chamber, and then supplying a reaction gas to the substrate. The process includes exhausting the chamber again, with the source gas and/or reaction gas supplied in temporally separated pulses. This technique allows for the formation of a film during a gas supply time determined by the concentration distribution of by-products formed on the substrate's surface.

Career Highlights

Ryohei Maeno has worked with prominent companies in the industry, including Hitachi Kokusai Electric Inc. and Hitachi, Ltd. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Throughout his career, Ryohei Maeno has collaborated with notable colleagues such as Yukinao Kaga and Arito Ogawa. These partnerships have likely fostered a creative environment that has led to advancements in semiconductor manufacturing techniques.

Conclusion

Ryohei Maeno's contributions to semiconductor manufacturing through his innovative patents and collaborations highlight his importance in the field. His work continues to influence the industry and improve manufacturing processes.