Ryo Edo

Title: Ryo Edo: Innovator in Exposure Apparatus Technology

Introduction

Ryo Edo is a prominent inventor based in Utsunomiya, Japan. He has made significant contributions to the field of exposure apparatus technology, holding a total of 9 patents. His work focuses on enhancing the efficiency and effectiveness of exposure processes in various applications.

Latest Patents

One of Ryo Edo's latest patents is an exposure apparatus that features a processing chamber, a vacuum chamber, and first and second load lock chambers. This innovative apparatus is designed to execute the exposure of a substrate to light via a mask. It includes a booth that stores the mask at atmospheric pressure, a processing chamber where exposure occurs at a first vacuum pressure, and a vacuum chamber that maintains a second vacuum pressure higher than the first. The design allows for efficient transfer of the mask between different pressure environments.

Another notable patent involves a processing unit that includes a supply section for storing a mask with a patterned surface. This supply section is maintained under atmospheric pressure, while the process chamber operates in a reduced pressure or vacuum atmosphere. The processing unit is designed to transfer the mask between the supply section and the process chamber, ensuring the protection of the patterned surface during the process.

Career Highlights

Ryo Edo is currently employed at Canon Kabushiki Kaisha, a leading company in imaging and optical products. His work at Canon has allowed him to develop cutting-edge technologies that advance the field of exposure apparatuses. His innovative designs have contributed to the company's reputation for excellence in the industry.

Collaborations

Ryo Edo has collaborated with notable colleagues such as Masami Yonekawa and Shinichi Hara. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies in exposure apparatus design.

Conclusion

Ryo Edo is a distinguished inventor whose work in exposure apparatus technology has led to significant advancements in the field. His innovative patents and contributions at Canon Kabushiki Kaisha highlight his commitment to excellence and innovation.