The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2004
Filed:
Oct. 19, 2000
Ryo Edo, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A substrate processing system includes a process chamber having a process station for processing a substrate in an ambience different from an atmosphere, a plurality of load-lock chambers each being connected to the process chamber through an opening/closing device and connected to the atmosphere through an opening/closing device, a first conveying device for conveying the substrate between the process chamber and the load-lock chambers, and a second conveying device for conveying the substrate between a supply station in the atmosphere and the load-lock chambers. Each of the load-lock chambers is arranged so that, prior to replacement of an ambience inside the load-lock chamber, the substrate is conveyed by the first conveying device from the load-lock chamber into the process chamber and then the substrate is conveyed into the load-lock chamber.