Santa Clara, CA, United States of America

Ryan C Boas


Average Co-Inventor Count = 4.4

ph-index = 4

Forward Citations = 89(Granted Patents)


Location History:

  • Fremont, CA (US) (2001)
  • Santa Clara, CA (US) (2002 - 2004)
  • Watertown, MA (US) (2005)
  • Belmont, MA (US) (2022)

Company Filing History:


Years Active: 2001-2022

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5 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Ryan C Boas

Introduction

Ryan C Boas is a notable inventor based in Santa Clara, CA. He has made significant contributions to the field of technology, particularly in the area of semiconductor processing. With a total of 5 patents to his name, Boas has demonstrated a commitment to advancing innovation in his industry.

Latest Patents

Among his latest patents, Boas has developed methods for variable etch depths. This invention involves producing grating materials with variable height fins. The method includes providing a mask layer atop a substrate, which features openings over processing areas. The substrate is then etched to recess these areas, forming a grating material and etching it to create structures oriented at a non-zero angle with respect to the substrate's top surface. Another significant patent focuses on advances in spike anneal processes for ultra shallow junctions. This improvement addresses the stringent requirements of <100 nm Ultra Shallow Junction technologies. Enhancements in cool down rates have led to improved spike sharpness, resulting in over a 10% improvement in sheet resistance and junction depth on substrates that underwent the improved spike profile.

Career Highlights

Ryan C Boas is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work has been pivotal in developing technologies that enhance semiconductor manufacturing processes. His innovative approaches have contributed to the efficiency and effectiveness of various semiconductor applications.

Collaborations

Throughout his career, Boas has collaborated with talented individuals such as Ajit Balakrishna and Benjamin B Bierman. These collaborations have fostered an environment of creativity and innovation, leading to the development of groundbreaking technologies.

Conclusion

Ryan C Boas is a distinguished inventor whose work has significantly impacted the semiconductor industry. His patents reflect a deep understanding of technology and a commitment to innovation. His contributions continue to shape the future of semiconductor processing.

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