The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 27, 2022

Filed:

May. 11, 2020
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Morgan Evans, Manchester, MA (US);

Joseph C. Olson, Beverly, MA (US);

Rutger Meyer Timmerman Thijssen, Sunnyvale, CA (US);

Daniel Distaso, Merrimac, MA (US);

Ryan Boas, Belmont, MA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76802 (2013.01); G03F 7/2051 (2013.01); G03F 7/70691 (2013.01);
Abstract

Methods of producing grating materials with variable height fins are provided. In one example, a method may include providing a mask layer atop a substrate, the mask layer including a first opening over a first processing area and a second opening over a second processing area. The method may further include etching the substrate to recess the first and second processing areas, forming a grating material over the substrate, and etching the grating material in the first and second processing areas to form a plurality of structures oriented at a non-zero angle with respect to a vertical extending from a top surface of the substrate.


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