Company Filing History:
Years Active: 2003-2022
Title: The Innovative Contributions of Ryan Burns
Introduction
Ryan Burns is a notable inventor based in Austin, TX (US), recognized for his significant contributions to the field of semiconductor technology. With a total of 5 patents, he has developed innovative methods that enhance the efficiency and effectiveness of semiconductor device fabrication.
Latest Patents
One of his latest patents focuses on the planarization of semiconductor devices. This method involves applying a surface treatment to selected surfaces of a substrate with non-planar topography, which includes structures defining recesses. The process directs fill material to the recesses while preventing adherence to the selected surfaces. Another significant patent addresses predicting across wafer spin-on planarization over a patterned topography. This method provides a more accurate prediction of spin-on layer planarization by generating a layer critical dimension model that simulates patterned topography trends based on various factors.
Career Highlights
Ryan has worked with prominent organizations such as Tokyo Electron Limited and the University of Texas System. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.
Collaborations
Throughout his career, Ryan has collaborated with esteemed colleagues, including Mark H Somervell and William John Koros. These partnerships have fostered an environment of innovation and creativity, leading to the development of impactful technologies.
Conclusion
Ryan Burns exemplifies the spirit of innovation in the semiconductor industry. His patents and collaborative efforts have significantly advanced the field, making him a key figure in the ongoing evolution of semiconductor technology.