Singapore, Singapore

Runshun Wang

USPTO Granted Patents = 4 

Average Co-Inventor Count = 5.2

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2020-2025

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4 patents (USPTO):

Title: Innovator Spotlight: Runshun Wang

Introduction

Runshun Wang is a distinguished inventor based in Singapore, known for his contributions to the field of semiconductor technology. With four patents to his name, Wang has made significant strides in enhancing fabrication methods and detection structures in microelectronics.

Latest Patents

Wang's latest patents showcase his expertise in the fabrication of air gaps and etch stop detection. One of his notable inventions is a method of fabricating an air gap, which involves a sophisticated process of receiving thickness information of both inter-metal and inter-layer dielectric layers formed on a substrate. By performing a series of controlled etchings, he is able to create precise air gaps essential for effective semiconductor performance.

Another significant patent addresses an etch stop detection structure. This structure comprises a substrate with a device and a detection region, integrated with multiple dielectric layers. By utilizing a trench that exposes a stop layer, this invention enables the effective detection of etch stop signals, thereby contributing to improved accuracy in semiconductor manufacturing.

Career Highlights

Runshun Wang's career at United Microelectronics Corp. has been marked by innovation and technical excellence. His work is pivotal in advancing semiconductor technologies, making it essential for enhancing device performance and reliability.

Collaborations

Throughout his professional journey, Wang has collaborated with fellow innovators Mengkai Zhu and Zhuona Ma. Their joint efforts contribute to the rich environment of innovation within United Microelectronics Corp., as they continue to push the boundaries of what is possible in semiconductor development.

Conclusion

Runshun Wang stands out as a valuable asset in the field of innovation. His patents reflect a deep understanding of semiconductor processes and a commitment to enhancing manufacturing techniques. As the industry evolves, Wang's contributions are likely to play a critical role in shaping the future of microelectronics.

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