Ruey Jiunn Guo

Title: Innovations of Ruey Jiunn Guo

Introduction

Ruey Jiunn Guo is a notable inventor based in Taipei Hsien, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique patent that addresses critical challenges in the industry.

Latest Patents

Ruey Jiunn Guo holds a patent titled "Process of fabricating an anti-fuse for avoiding a key hole exposed." This patent describes a process for forming an anti-fuse, which includes several intricate steps. Initially, an inter-metal dielectric layer is created on a substrate, featuring a funnel-shaped via. A first conductive layer is then deposited over the substrate and fills the funnel-shaped via. Following this, a chemical mechanical polishing process is employed to remove the excess first conductive layer outside the funnel-shaped via, resulting in a conductive plug. An oxide chemical mechanical polishing process is subsequently performed to smooth the surface of the conductive plug. A dielectric layer is then formed on top of the conductive plug, followed by the creation of a top plate on the dielectric layer. An insulating layer is formed over the substrate, which includes a via that exposes the top plate. Finally, a second conductive layer is deposited over the substrate and fills the via.

Career Highlights

Ruey Jiunn Guo is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to further his research and development efforts in innovative technologies.

Collaborations

Ruey Jiunn Guo collaborates with Tsong-Minn Hsieh, a talented woman in the field. Their partnership has contributed to advancements in their respective projects.

Conclusion

Ruey Jiunn Guo's contributions to semiconductor technology through his patent and work at United Microelectronics Corporation highlight his role as an influential inventor. His innovative processes continue to shape the industry and pave the way for future advancements.