Company Filing History:
Years Active: 2005-2009
Title: Ruediger Schmolke: Innovator in Semiconductor Technology
Introduction
Ruediger Schmolke is a notable inventor based in Burghausen, Germany. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to machining and coating semiconductor wafers.
Latest Patents
Schmolke's latest patents include a method for machining a semiconductor wafer on both sides in a carrier. This method allows for the simultaneous reduction of the wafer's thickness from both the front and back surfaces. The semiconductor wafer is guided in a cutout in a carrier, ensuring that it is thinner than the carrier body while being thicker than an inlay used to protect the wafer. The carrier is designed with varying thicknesses, which enhances the machining process. His second patent involves a process and apparatus for epitaxially coating a semiconductor wafer. This process minimizes the diffusion of dopants from the back surface of the wafer, resulting in a semiconductor wafer with specific resistivity characteristics.
Career Highlights
Ruediger Schmolke is currently associated with Siltronic AG, a leading company in the semiconductor industry. His work has been instrumental in advancing the technology used in semiconductor manufacturing, particularly in achieving high-quality wafers with precise specifications.
Collaborations
Throughout his career, Schmolke has collaborated with esteemed colleagues such as Thomas Buschhardt and Gerhard Heier. These collaborations have further enriched his contributions to the field.
Conclusion
Ruediger Schmolke's innovative patents and career in semiconductor technology highlight his significant impact on the industry. His work continues to influence advancements in semiconductor manufacturing processes.