This inventor holds 6 USPTO granted patents. Top assignees: Merck Patent Gesellschaft MIT Beschrankter Haftung, Ciba-Geigy Corporation, Merck Patent Gesellschaft MIT Beschraenkter Haftung. Active years: 1978-1990.
Location History:
- Darmstadt, DE (1978)
- Aschaffenburg, DE (1985 - 1990)
Company Filing History:
4 out of 1,248 
1 out of 6,858 
1 out of 100 Years Active: 1978-1990
Title: Rudolf Klug: Innovator in Photoresist Technology
Introduction
Rudolf Klug is a notable inventor based in Aschaffenburg, Germany. He has made significant contributions to the field of photoresist technology, particularly in the development of negative photoresists of the polyimide type. With a total of 6 patents to his name, Klug's work has had a lasting impact on the industry.
Latest Patents
One of Klug's latest patents focuses on negative photoresists of the polyimide type containing 1,2-disulfones. This invention relates to stabilized solutions of radiation-crosslinkable polymer precursors that are highly heat-resistant. These solutions contain chelate complex-formers as stabilizers, which prevent premature crosslinking and allow for long-term storage and usability.
Career Highlights
Throughout his career, Klug has worked with prominent companies in the chemical and materials sectors. Notably, he has been associated with Merck Patent Gesellschaft mit beschränkter Haftung and Ciba-Geigy Corporation. His work in these organizations has contributed to advancements in polymer technology and photoresist applications.
Collaborations
Klug has collaborated with several professionals in his field, including Hartmut Hartner and Hans-Joachim Merrem. These collaborations have further enriched his research and development efforts.
Conclusion
Rudolf Klug's innovative work in photoresist technology has established him as a key figure in the industry. His patents and collaborations reflect his commitment to advancing the field and enhancing the capabilities of materials used in various applications.