Herentals, Belgium

Ruben Hendrik C Dilissen

This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ruben Hendrik C Dilissen. Retrieved from https://idiyas.com/inventor/ruben-hendrik-c-dilissen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Ruben Hendrik C. Dilissen: Optical Isolation for EUV Lithography

Introduction

Ruben Hendrik C. Dilissen is an inventor based in Herentals, Belgium. His patent work includes technology for optical isolation in seed lasers, a component relevant to advanced laser systems and lithographic equipment.

Latest Patents

Dilissen is associated with 1 patent: “Seed laser optical isolator, seed isolator module, EUV radiation source, lithographic apparatus and optical isolator operating method.” The invention describes an optical isolator that uses an acousto-optic modulator crystal to manipulate incident laser light. A cooling system regulates the crystal’s temperature, with a heat-transfer assembly—including an active heat-transfer element—moving heat from the crystal to a fluid-cooled element. The design is intended for use in seed laser systems, extreme ultraviolet (EUV) radiation sources, and lithographic apparatus.

Career Highlights

Dilissen is associated with ASML Netherlands B.V., a company whose technologies support semiconductor manufacturing. His patent focuses on managing heat in an optical isolator, addressing a practical engineering challenge in laser-based lithography systems.

Collaborations

The listed coworkers associated with Dilissen include Karel Joop Bosschaart and Tomasz Czarnota.

Conclusion

Ruben Hendrik C. Dilissen’s patent describes a cooled optical isolator designed for seed lasers and lithography applications, reflecting his contribution to technologies used in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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