East Amherst, NY, United States of America

Ronald William Shrewsbury


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 25(Granted Patents)


Company Filing History:


Years Active: 2003-2008

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2 patents (USPTO):Explore Patents

Title: **Innovator Spotlight: Ronald William Shrewsbury**

Introduction

Ronald William Shrewsbury, an accomplished inventor based in East Amherst, NY, is recognized for his contributions to the field of semiconductor gas purification. With two patents to his name, Shrewsbury has demonstrated his expertise and commitment to advancing technology in a critical area of engineering.

Latest Patents

Shrewsbury's latest inventions focus on the purification of semiconductor gases. His first patent, titled "Method for Purifying Semiconductor Gases," outlines a process for producing ultra-high purity ammonia gas. This method involves directing ammonia fluid with minimal liquid phase moisture content through an evaporation system, resulting in refined vapor phase ammonia. Additionally, his second patent, also centered on purifying semiconductor gases, details a sophisticated approach to transforming an impure liquefied gas into an ultra-high purity gas. This process includes several stages: passing the impure gas through adsorption means, evaporation, and further purification, culminating in a gas of exceptional purity.

Career Highlights

Currently working at Praxair Technology, Inc., Shrewsbury has leveraged his skills to innovate within the semiconductor industry. His focus on enhancing gas purity not only contributes to the efficiency of semiconductor manufacturing but also pushes the boundaries of what is possible in electronics technology.

Collaborations

In his career, Shrewsbury has collaborated with notable colleagues such as Salim Sateria and Arthur Edward Holmer. These partnerships have facilitated a synergy of ideas and expertise, fostering innovation within their projects and leading to significant advancements in their field.

Conclusion

Ronald William Shrewsbury exemplifies the spirit of innovation through his dedication to improving semiconductor gas purification methods. As an inventor with a proven track record, his contributions play a fundamental role in the ongoing development of technology in the semiconductor domain. His work not only reflects a commitment to high standards but also greatly influences the efficiency and performance of semiconductor applications.

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