Glenwood City, WI, United States of America

Ronald J Hanestad


Average Co-Inventor Count = 4.2

ph-index = 3

Forward Citations = 24(Granted Patents)


Location History:

  • Hammond, MN (US) (2000)
  • Glennwood City, WI (US) (2009)
  • Glenwood City, WI (US) (2013 - 2014)

Company Filing History:


Years Active: 2000-2014

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4 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Ronald J. Hanestad

Introduction

Ronald J. Hanestad is a notable inventor based in Glenwood City, Wisconsin. He has made significant contributions to the field of material removal processes, particularly in the semiconductor industry. With a total of 4 patents to his name, Hanestad's work has had a considerable impact on manufacturing techniques.

Latest Patents

Hanestad's latest patents include a method for removing materials from substrates. This innovative process involves dispensing a liquid sulfuric acid composition onto a material-coated substrate. The composition is designed to effectively remove photoresist and other materials. The substrate is heated to a temperature of at least 90°C, either before, during, or after the application of the liquid sulfuric acid composition. Following this, the composition is exposed to water vapor, which increases its temperature, enhancing the removal process. The substrate is then rinsed to eliminate the material effectively.

Another significant patent by Hanestad is an apparatus for removing materials from one or more substrates. This method mirrors the previous patent's process, emphasizing the importance of temperature and the liquid sulfuric acid composition in achieving optimal results.

Career Highlights

Throughout his career, Hanestad has worked with several prominent companies, including FSI International, Inc. and Tel FSI, Inc. His experience in these organizations has allowed him to refine his expertise in material removal processes and contribute to advancements in the field.

Collaborations

Hanestad has collaborated with notable colleagues such as Kurt Karl Christenson and Patricia Ann Ruether. These partnerships have likely enriched his work and led to further innovations in his area of expertise.

Conclusion

Ronald J. Hanestad's contributions to the field of material removal processes are noteworthy. His innovative patents and career achievements reflect his dedication to advancing technology in the semiconductor industry.

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